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Loading effect for deposition reactions

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January 4, 2017, 01:44	Loading effect for deposition reactions	#1
cfdkorea New Member anonymus Join Date: Apr 2016 Posts: 11 Rep Power: 9	Hi, I am tryong to model the depostion of silicon on a 99 percent masked (non reactive) surface. So, can washcoat factor =0.1 take into account that non reactive surface. I will be highly thankful if anyone could help in this regard.

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deposition, fluent, loading effect, washcoat factor

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