chemical reaction parameters for SiO2 deposition
 

Hi,

Everyone. Right now, I am working on the CFD modeling of SiO2 deposition from SiH4 and O2 by CVD process. To set up the chemical reaction in Fluent, pre-Expotential factor and activation energy are needed. However I can not find these parameters from the available references. Do you guys have any suggestion to find these two parameters? Thanks in advance.

Jiuan

Re: chemical reaction parameters for SiO2 depositi
 

These 2 parameters are must for specifying chemical reaction, since it is the one which determines the Rate of generation or rate of depletion of any species. If you cant able to get proper reference. these parameters can be found with simple experiments even.

Re: chemical reaction parameters for SiO2 depositi
 

Thanks for your reply. Actually I have searched some reference, but can not find these two parameters. In my current lab, we do not have equipment to do the simple experiments. However I believe this chemical reaction has been studied a lot before since it is a classic one, but maybe because the reference is old, therefore it is not easy to find them.

Hello, I'm a Belgium student and I am also looking for the same data for some homework I've to do.:confused:
My professor told me that these data were easy to find but I'can't find it:mad: I'tried to serch the net or to search scientific publications but every time I found thousands of results but I could not find the answer to my question.
The most interesting content I found is this post and I hope you got some solution since you initially post it.

If somebody can help me?:)

Thanks