CVD_mass fraction over wafer
I'm trying to model a 2D CVD reactor for atmospheric pressure silicon epitaxy of silane using the silane-hydrogen-3-step fluent's material mixture. The problem is that the SiH2 mass fraction takes 0 values over the wafer while the mole fraction doesn't. Does anyone have any idea why this happens?
|All times are GMT -4. The time now is 00:08.|