|November 25, 2005, 06:17||
CVD / ALD Modelling
I want to simulate an Atomic Layer Deposition process using a commerical code. Does anyone have any recommendations on which code might be the best one to use for ALD modelling and does anyone here have any such experience? I need to find out what the input boundary conditions are i.e. temp, pressure, sticking Coeff, etc.
I'm particularly interested in information about the sticking coefficient.
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