CFD Events Calendar, Event Record #23345
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Modeling Remote Plasma Sources Webinar
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We would like to invite you to register for our
complimentary CFD Multiphysics Webinar on Modeling Remote
Plasma Sources.
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| Date: |
June 9, 2016
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| Location: |
http://www.esi-group.com/company/events/2016/modeling-remote-plasma-sources-webinar
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| Contact Email: |
Michelle McDowell
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| Special Fields: |
Multiphysics
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| Type of Event: |
Online Event, International
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| Description: |
Remote Plasma Sources (RPS) are becoming popular in the
semiconductor industry demonstrating advantages beyond the
conventional chamber cleaning, photo-resist removal, and
stripping applications. In RPS, the plasma is upstream from
the wafer and only the activated species diffuse downstream
to react with wafer thereby minimizing the wafer damage from
the bombardment of high energy ions. However, the transport
of activated species from the plasma source to the process
chamber is critical and complicated. In this webinar, we
discuss how ACE+ Suite is ideal for modeling and process
with dedicated features including:
- ICP Model for inductively coupled discharges
- DBD Model and CCP Model for capacitively coupled discharges
- Global Model for analyzing complex multidimensional
reaction pathways
We will start with an overview of above Plasma Modeling
features in ACE+ Suite and relevant industrial examples. We
will then give a live demonstration of ACE+ Suite on a
remote plasma source configuration and conclude with an
interactive Q&A session.
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Event record first posted on May 20, 2016, last modified on May 20, 2016
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