which modelto be used for electron beam physical vapour deposition system...???
I need help regarding which model to be used in my problem
I am doing m.tech project and I want to simulate electron Beam physical vapour deposition system for deposition of a material (coating) on substrate.
The material is evaporated and then coated over the substrate, put inside the vacuum chamber and I want to find out the thickness of coating deposited over the surface of substrate...
Can any one suggest which model should I use?
I have chemical reaction of material that is going to occur inside the chamber and at last the final product will get deposit over the substrate...
Reaction are like
A ---> B+C
B ---> D+C
Y+C ---> A
please suggest me which model I should use and one important thing is my material which i used for coating over substrate is ablimed material means its directly goes in solid phase from vapour phase there is no any liquid phase occurrence....
Need help ....
thanks in advance.....
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