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Loading effect for deposition reactions

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Old   January 4, 2017, 02:44
Default Loading effect for deposition reactions
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anonymus
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Hi,

I am tryong to model the depostion of silicon on a 99 percent masked (non reactive) surface. So, can washcoat factor =0.1 take into account that non reactive surface.

I will be highly thankful if anyone could help in this regard.
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