|January 4, 2017, 02:44||
Loading effect for deposition reactions
Join Date: Apr 2016
Posts: 7Rep Power: 2
I am tryong to model the depostion of silicon on a 99 percent masked (non reactive) surface. So, can washcoat factor =0.1 take into account that non reactive surface.
I will be highly thankful if anyone could help in this regard.
|deposition, fluent, loading effect, washcoat factor|
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