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cfduser10 May 1, 2010 09:56

CVD_mass fraction over wafer
I'm trying to model a 2D CVD reactor for atmospheric pressure silicon epitaxy of silane using the silane-hydrogen-3-step fluent's material mixture. The problem is that the SiH2 mass fraction takes 0 values over the wafer while the mole fraction doesn't. Does anyone have any idea why this happens?

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