Chemical Vapor Deposition problems???
Has anyone worked on modeling the hydrodynamics, heat transfer, gas phase and surface reactions in chemical reactors? I am modeling the silcon deposition onto a silicon wafer surface. What kinds of numerical difficulties have you run into, if any? I would like to chat with you.
Re: Chemical Vapor Deposition problems???
CFD-ACE+ from CFDRC Research Corp. is the leading CFD solver suite used for modeling semiconductor processes/equipment including a range of CVD processes. You can find more information at:
CFD-ACE+ for semiconductor applications
If you need any further information, details please feel free to contact me.
R. Sukumar CFD Research Corporation
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