Using Cradle scSTREAM to Analyze Air Flow in Semiconductor Manufacturing Equipment

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Using Cradle scSTREAM to Analyze Air Flow in Semiconductor Manufacturing Equipment

Posted By:	sakurai@cradle-cfd.com
Date:	Wed, 25 Nov 2015, 12:20 a.m.

The Hirata Corporation designs, engineers, and produces manufacturing production systems. They used Cradle scSTREAM to analyze the air flow in semiconductor wafer manufacturing equipment where the production space must be kept absolutely clean.

In this narrated interview, Takahiro Motoyama and Michitaka Matsumura from the Development Division at the Hirata Corporation discuss how Cradle scSTREAM CFD simulations were used to investigate nitrogen dispersion for preventing semiconductor wafer oxidation during transport.

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